About Us
Guangdong Tisnawell New Material Technology Co., Ltd. ("Tisnawell / TSNW") was founded in Mar. 2018 with the background of founder's 23-year experience in material processing application. Taking the magnetron sputtering PVD as the core, the company has formed a manufacturing system from equipment development, design, assembly, PVD process realization to material modification, and has a number of invention patents and certifications.
TSNW provides PVD decorative film, functional film, and optical film products for users in the fields of metal, optical lenses, film materials and ceramics.